Controlling Film Thickness Distribution by Magnetron Sputtering with Rotation and Revolution

Film thickness distribution in magnetron sputtering

Of crucial importance to the thin film process engineer is an understanding of the parameters which affect the film thickness distributions which may be obtained from magnetron sources. This paper describes how variations in source design, target erosion and source-to-substrate distance affect observed uniformities from a magnetron source. A simple method of simulating magnetron sources using t...

Off-normal Film Growth by High Power Impulse Magnetron Sputtering

In this study we contribute towards establishing the process-microstructure relationships in thin films grown off-normally by ionized physical vapor deposition. High power impulse magnetron sputtering (HiPIMS) is used at various peak target powers and deposition rates to grow copper (Cu) and chromium (Cr) films from a cathode placed at an angle 90 degrees with respect to the substrate normal. F...

Thin-film TiPbO3 varistors obtained by two-source magnetron sputtering

The Effect of Substrate on Structural and Electrical Properties of Cu3N Thin Film by DC Reactive Magnetron Sputtering

The aim of this paper is to study the effect of substrate on the Cu3N thin films. At first Cu3N thin films are prepared using DC magnetron sputtering system. Then structural properties, surface roughness, and electrical resistance are studied using X-ray diffraction (XRD), the atomic force microscope (AFM) and four-point probe techniques respectively. Finally, the results are investigated and c...

CrNx Films Prepared by DC Magnetron Sputtering and High-Power Pulsed Magnetron Sputtering: A Comparative Study

CrNx (0 ≤ x ≤ 0.91) films synthesized using highpower pulsed magnetron sputtering, also known as high-power impulse magnetron sputtering (HiPIMS), have been compared with those made by conventional direct-current (dc) magnetron sputtering (DCMS) operated at the same average power. The HiPIMS deposition rate relative to the DCMS rate was found to decrease linearly with increasing emission streng...